X为了获得更好的用户体验,请使用火狐、谷歌、360浏览器极速模式或IE8及以上版本的浏览器
帮助中心 | 关于我们
欢迎来到合肥巢湖经开区网上技术交易平台,请 登录 | 注册
尊敬的 , 欢迎光临!  [会员中心]  [退出登录]
当前位置: 首页 >  科技成果  > 详细页

[00261734]高纯钛生产工艺

交易价格: 面议

所属行业: 钒钛冶金

类型: 专利

技术成熟度: 通过小试

专利所属地:US美国

专利号:5772724

交易方式: 技术转让 技术转让 技术入股

联系人: 四川钒钛产业技术研究院

进入空间

所在地:四川攀枝花市

服务承诺
产权明晰
资料保密
对所交付的所有资料进行保密
如实描述
|
收藏
|

技术详细介绍

项目简介:

The present invention provides a method for producing high-purity titanium from titanium sponge obtained by the Kroll process in which a core of the cylindrical lump of titanium sponge obtained with a weight less than 20-30% of that of the cylindrical lump is separated by cutting off from the lump a bottom portion, a top portion and a peripheral portion, and the core is cut by a press into grains of specific size, which are melted into ingot or refined by reaction with iodine. The high-purity titanium thus produced contains less than 300 ppm of oxygen and less than 10 ppm each of iron, nickel, chromium, aluminum and silicon, the balance being titanium and inevitable impurities; or less than 200 ppm of oxygen and less than 1 ppm each of iron, nickel, chromium, aluminum and silicon, the balance being titanium and inevitable impurities. Thus the invention provides titanium materials of very high purity suitable for thin film deposition as wiring of LSIs from titanium sponge obtained by the Kroll process.

项目核心创新点:

项目详细用途:

预期效益说明:

项目简介:

The present invention provides a method for producing high-purity titanium from titanium sponge obtained by the Kroll process in which a core of the cylindrical lump of titanium sponge obtained with a weight less than 20-30% of that of the cylindrical lump is separated by cutting off from the lump a bottom portion, a top portion and a peripheral portion, and the core is cut by a press into grains of specific size, which are melted into ingot or refined by reaction with iodine. The high-purity titanium thus produced contains less than 300 ppm of oxygen and less than 10 ppm each of iron, nickel, chromium, aluminum and silicon, the balance being titanium and inevitable impurities; or less than 200 ppm of oxygen and less than 1 ppm each of iron, nickel, chromium, aluminum and silicon, the balance being titanium and inevitable impurities. Thus the invention provides titanium materials of very high purity suitable for thin film deposition as wiring of LSIs from titanium sponge obtained by the Kroll process.

项目核心创新点:

项目详细用途:

预期效益说明:

推荐服务:

Copyright    ©    2016    合肥巢湖经开区网上技术交易平台    All Rights Reserved

皖ICP备15001458号

运营商:科易网